Nuvoton Technology Corporation Japan (NTCJ) introduced on January 20 the graduation of mass manufacturing for its high-power ultraviolet semiconductor laser. The laser boasts industry-leading optical output in a 9.0-mm diameter CAN bundle, or a TO-9. The product is exclusive in its achievement of excessive output energy, quick wavelength, and lengthy lifetime, a trio of things beforehand believed onerous to achieve for ultraviolet semiconductor lasers.
Through NTCJ’s proprietary machine construction and superior high-heat-dissipation packaging know-how, the high-power ultraviolet laser contributes to specific patterning and enhanced manufacturing throughput in maskless lithography for superior semiconductor packaging. Maskless lithography is turning into more and more related, requiring increased efficiency and smaller transistor measurement to maintain up with the demand for information-processing capabilities pushed by the evolution of synthetic intelligence.
One problem to maskless lithography has been discovering a light-weight supply that may ship shorter wavelengths and better output ranges to facilitate finer wiring and enhance tools throughput. To overcome this, NTCJ has leveraged its over 40 years of expertise in laser design and manufacturing, ensuing within the improvement and commercialization of an ultraviolet semiconductor laser with a wavelength of 379 nm and an output of 1.0 W.
Traditionally, ultraviolet semiconductor lasers are inclined to expertise important warmth technology because of low wall-plug effectivity and a bent for machine degradation brought on by ultraviolet mild. However, NTCJ has developed an answer with elevated wall-plug effectivity and superior warmth dissipation that allows excessive output ranges above 1.0 W. Consequently, this extends the lifetime of optical units utilizing ultraviolet mild.
The new addition to NTCJ’s lineup affords clients an alternative choice to mercury lamps primarily based on semiconductor lasers. The high-output ultraviolet laser has been launched at SPIE Photonics West 2026 in San Francisco, USA, and OPIE’26 in Yokohama, Japan.